New silicon hard mask material development for sub-5nm node
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Simplified process flow illustrating (a) "via-first" and (b)... | Download Scientific Diagram
SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki
The micropatterns (first figure) can be achieved by | Chegg.com
Hard Mask Fabrication (HMF) - NanoSearcher
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
Materials | Free Full-Text | A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm
In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Spin on Hard-Mask Material - diagram, schematic, and image 08
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
Semiconductor Process Materials|Semiconductor material: etc
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
KR101484568B1 - High etch-resistant carbon hard mask condensasion polymer and anti-reflection hard mask composition including same, and pattern-forming method of semiconductor device using same - Google Patents
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Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
